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EUV machines reflect invisible ultraviolet beams using precision mirrors in vacuum chambers. The figure is taken from NIST Physical Measurement Laboratory, which is linked in full on this page. Every fact on Mondo Knows names its source rather than repeating an unsourced claim.

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Extreme ultraviolet lithography uses 13.5 nanometre light to print microchips

EUV machines reflect invisible ultraviolet beams using precision mirrors in vacuum chambers

Modern semiconductor fabrication uses extreme ultraviolet (EUV) light with a wavelength of just 13.5 nanometres to etch microchip features. Because EUV light is absorbed by air and glass lenses, machines operate under high vacuum and bounce light off multi-layer silicon-molybdenum mirrors. This allows photolithography printers to create circuit features only a few nanometres wide.

Where this comes from

NIST Physical Measurement Laboratory

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Tags: lithography, semiconductors, nanotechnology

Extreme ultraviolet lithography uses 13.5 nanometre light to print microchips: the short answers

Where does this come from, and can I check it?: EUV machines reflect invisible ultraviolet beams using precision mirrors in vacuum chambers. The figure is taken from NIST Physical Measurement Laboratory, which is linked in full on this page. Every fact on Mondo Knows names its source rather than repeating an unsourced claim.
Is this really a technology fact?: Yes. It sits on the Technology shelf, one of 1,090 sourced facts grouped into space, animals, the human body, history, science and more. Category pages collect every fact in the same field.
What else can I read about it?: The links under the fact point to a quiz, game, puzzle or calculator on the same subject, and the shelf below shows related facts. The wording here is original, and quoted phrases are marked as quotations.